Efficient, high-throughput post-STI CMP cleaning

被引：0
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作者：
Black, Andrew [1 ,3 ]
Liu, Albert H. [1 ]
Jiang, Linda T. [2 ]
Hymes, Diane [2 ,4 ]
机构：
[1] Philips Semiconductor, San Antonio, TX, United States
[2] Lam Research Corp., Fremont, CA, United States
[3] Philips Semiconductor, 9651 Westover Hills Blvd., San Antonio, TX 78251, United States
[4] CMP/Clean Prod. Div. at Lam Res., Fremont, CA, United States
来源：
| 2000年 / PennWell Publ Co, Nashua, NH, United States卷 / 43期
关键词：
Delivery - Microscratches - Shallow trench isolation - Slurry particles;
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