Concept of a Deflection-Focusing System in Electron Optics.

被引：0
|
作者：
De Chambost, E.
机构：
来源：
| 1978年 / 10卷 / 04期
关键词：
ELECTRON BEAMS - Focusing;
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
In electron beam microlithography, a magnetic lens and deflection system should allow the beam to be scanned over as wide a field as possible with minimum aberration. A study was carried out to optimize the principal parameters of the system.
引用
收藏
页码：757 / 774
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