Reducing photocurable polymer pattern shrinkage and roughness during dry etching in photo-nanoimprint lithography

被引：0
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作者：
Kim, Sang Hoon [1 ]
Hiroshima, Hiroshi [1 ]
Inoue, Seiji [1 ]
Kurashima, Yuichi [1 ]
Komuro, Masanori [1 ]
机构：
[1] MIRAI, Adv. Semiconductor Research Center, Natl. Inst. Adv. Indust. Sci./T., 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2004年 / 43卷 / 6 B期
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页码：4022 / 4026
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