High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the sigma7300 DUV mask writer

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[1] Xing, Kezhao
[2] Karlsson, Johan
[3] Paulson, Adisa
[4] Björnberg, Charles
[5] Lundvall, Axel
[6] Högfeldt, Peter
[7] Vedenpää, Jukka
[8] Goodoree, Robin
[9] Bjuggren, Måns
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Xing, K. (kezhao.xing@micronic.se) | / SPIE - The International Society for Optical Engineering卷 / SPIE期
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    Kjellberg, L
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