Ferroelectric thin films and their applications

被引：0
|
作者：
Wersing, Wolfram [1 ]
Bruchhaus, Rainer [1 ]
机构：
[1] Siemens AG, Muenchen, Ger
来源：
Proceedings of SPIE - The International Society for Optical Engineering | 1994年 / 2364卷
关键词：
Improved devices - Microelectronic design - Micromechanical components - Multilayer capacitors;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：12 / 20
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