Effects of gamma-ray irradiation on electrical characteristics of 6H-SiC metal-oxide-semiconductor structures

被引:0
|
作者
Yoshikawa, M.
Takahashi, Y.
Ohshima, T.
Ohnishi, K.
Itoh, H.
Okumura, H.
Nashiyama, I.
Yoshida, S.
机构
关键词
Electric properties - Electron traps - Gamma rays - High temperature effects - Ionizing radiation - Semiconductor device manufacture - Silicon carbide;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:39 / 47
相关论文
共 50 条
  • [1] Effects of gamma-ray irradiation on the electrical characteristics of SiC metal-oxide-semiconductor structures
    Yoshikawa, M
    Ohshima, T
    Itoh, H
    Nashiyama, I
    Takahashi, Y
    Ohnishi, K
    Okumura, H
    Yoshida, S
    [J]. ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS, 1998, 81 (10): : 37 - 47
  • [2] Effects of gamma-ray irradiation on the electrical characteristics of SiC metal-oxide-semiconductor structures
    Yoshikawa, Masahito
    Ohshima, Takeshi
    Itoh, Hisayoshi
    Nashiyama, Isamu
    Takahashi, Yoshihiro
    Ohnishi, Kazunori
    Okumura, Hajime
    Yoshida, Sadafumi
    [J]. Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi), 1998, 81 (10): : 37 - 47
  • [3] Generation of interface traps and oxide-trapped charge in 6H-SiC metal-oxide-semiconductor transistors by gamma-ray irradiation
    Ohshima, T
    Yoshikawa, M
    Itoh, H
    Aoki, Y
    Nashiyama, I
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1998, 37 (8B): : L1002 - L1004
  • [4] Gamma-ray irradiation effects on the electrical characteristics of 6H-SiC MOSFETs with annealed gate-oxide
    Ohshima, T
    Lee, KK
    Ohi, A
    Yoshikawa, M
    Itoh, H
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 1093 - 1096
  • [5] Calculation of theoretical capacitance-voltage characteristics of 6H-SiC metal-oxide-semiconductor structures
    Raynaud, C
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 88 (01) : 424 - 428
  • [6] Depth profile of trapped charges in oxide layer of 6H-SIC metal-oxide-semiconductor structures
    Yoshikawa, MR
    Saitoh, K
    Ohshima, T
    Itoh, H
    Nashiyama, I
    Yoshida, S
    Okumura, H
    Takahashi, Y
    Ohnishi, K
    [J]. JOURNAL OF APPLIED PHYSICS, 1996, 80 (01) : 282 - 287
  • [7] Depth profile of oxide-trapped charges in 6H-SiC metal-oxide-semiconductor structures irradiated with gamma-rays
    Yoshikawa, M
    Saitou, K
    Ohshima, T
    Itoh, H
    Nashiyama, I
    Okumura, H
    Yoshida, S
    [J]. REPORT OF RESEARCH CENTER OF ION BEAM TECHNOLOGY HOSEI UNIVERSITY, SUPPLEMENT NO 14, MARCH 1996, 1996, : 159 - 164
  • [8] EFFECTS OF GAMMA-RAY IRRADIATION ON CUBIC SILICON-CARBIDE METAL-OXIDE-SEMICONDUCTOR STRUCTURE
    YOSHIKAWA, M
    ITOH, H
    MORITA, Y
    NASHIYAMA, I
    MISAWA, S
    OKUMURA, H
    YOSHIDA, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1991, 70 (03) : 1309 - 1312
  • [9] EXTREMELY LONG CAPACITANCE TRANSIENTS IN 6H-SIC METAL-OXIDE-SEMICONDUCTOR CAPACITORS
    PAN, JN
    COOPER, JA
    MELLOCH, MR
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 78 (01) : 572 - 574
  • [10] Effect of gamma-ray irradiation on the characteristics of 6H silicon carbide metal-oxide-semiconductor field effect transistor with hydrogen-annealed gate oxide
    Ohshima, T
    Itoh, H
    Yoshikawa, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 90 (06) : 3038 - 3041