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- [3] PREPARATION OF CU-O FILMS BY SPUTTERING USING HE GAS JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B): : 4482 - 4485
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- [5] Growth and characterization of Al films by electron cyclotron resonance plasma-assisted atomic deposition Sang, L. (lppmchenqiang@hotmail.com), 1600, Science Press, 18,Shuangqing Street,Haidian, Beijing, 100085, China (33):
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- [8] Preparation of α-Al2O3 thin films by electron cyclotron resonance plasma-assisted pulsed laser deposition and heat annealing JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 26 (03): : 380 - 384
- [10] Preparation of Pb(Zr, Ti)O3 thin films by plasma-assisted sputtering JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (9B): : 5375 - 5377