InN thin-film growth using N2, NH3 and N2-He RF plasmas

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作者：
Sato, Yuichi [1 ]
Kakinuma, Sei [1 ]
Sato, Susumu [1 ]
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[1] Akita Univ, Akita, Japan
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| 1600年 / JJAP, Minato-ku, Japan卷 / 33期
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