Plasma-enchanced chemical vapor deposition of silicon nitride

被引：0
|
作者：
Kobayashi, Ikunori [1 ]
Ogawa, Tetsu [1 ]
Hotta, Sadayoshi [1 ]
机构：
[1] Matsushita Electric Industrial Co, Ltd, Moriguchi, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1992年 / 31卷 / 2 A期
关键词：
12;
D O I：
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中图分类号：
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摘要：
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页码：336 / 342
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