Effect of deposition site condition on the initial growth process of electroless CoNiP films

被引：0

作者：

Itakura, Kunimasa ^{[1
]}

Homma, Takayuki ^{[1
]}

Osaka, Tetsuya ^{[1
]}

机构：

[1] Department of Applied Chemistry, Sch. Sci. Eng., Waseda U., Tokyo, Japan

来源：

Electrochimica Acta | 1999年 / 44卷 / 21期

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D O I：

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摘要：

引用

页码：3707 / 3711

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