Migration-enhanced epitaxy of cubic BN: An ab initio study

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作者
Koga, Hiroaki [1 ,2 ]
Miyazaki, Tsuyoshi [2 ]
Watanabe, Satoshi [1 ]
Ohno, Takahisa [2 ]
机构
[1] Department of Materials Engineering, Graduate School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
[2] Compl. Materials Science Center, Natl. Inst. for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
来源
| 1600年 / Japan Society of Applied Physics卷 / 43期
关键词
cBN(001) - First-principles calculation - Migration-enhanced epitaxy (MEE) - Polycrystalline films;
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摘要
Migration-enhanced epitaxy (MEE) is shown to be promising as a nonenergetic epitaxial growth method of cubic BN (cBN) for the first time, by examining the deposition of N (B) atoms on the B (N) surface of cBN(001) with ab initia calculation. We find that MEE has the potential for realizing the layer-by-layer epitaxial growth of cBN on cBN(001), owing to the epitaxial nature of monolayer deposition, the saturation of N adsorption at monolayer coverage, the high mobility of a B adatom on a B island which favors the. formation of a flat B surface, and the B-N exchange reaction which repairs the defects created by the excess N (B) adatoms on the N (B) surface.
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