High-density microwave plasma for high rate deposition of microcrystalline silicon

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Dept. of Funct. Materials Science, Fac. Eng., Saitama Univ., 255 S., Saitama, Japan [1 ]
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Thin Solid Films | / 1卷 / 7-11期
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The authors would like to express thanks to Professor. R. Itatani of Nihama National College of technology. Also thanks to Miss. Y. Wasai; Mrs. N. Nabatova-Gabin and Mr. K. Kainuma in Atago Co; Ltd. for the spectroscopic ellipsometry (SE) and Raman mapping measurements. This work was in part supported by Research Foundation for the Electrotechnology of Chubu;
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