Electron transport properties of amorphous Tix(Cu0.70Al0.30)1-x and Tix(Cu0.15Al0.85)1-x quench condensed thin films

被引：0
|
作者：
Rathnayaka, K.D.D. [1 ]
Hennings, B.D. [1 ]
Naugle, D.G. [1 ]
机构：
[1] Texas A and M Univ, College Station, United States
来源：
Journal of Non-Crystalline Solids | 1996年 / 205-207卷 / pt 2期
关键词：
Amorphous alloys - Composition effects - Condensation - Electric conductivity - Electron transport properties - Hall effect - Thin films - Titanium alloys;
D O I：
10.1016/S0022-3093(96)00290-6
中图分类号：
学科分类号：
摘要：
The electrical resistivity ρ, temperature coefficient of resistance TCR and the Hall coefficient RH of amorphous Ti-Cu-Al thin film alloys prepared by co-condensation in UHV onto liquid nitrogen cooled substrates are reported as a function of Ti concentration for two different ratios of the simple metal components: Tix(Cu0.70Al0.30)1-x with 0.22x(Cu0.15Al0.85)1-x with 0.15H is positive and usually larger for more Al rich alloys. TCR is negative, and ρ is comparable to the corresponding TixAl1-x films.
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页码：665 / 668
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