Influence of argon pressure on the structure of sputtered molybdenum: from porous amorphous to a new type of highly textured film

被引:0
|
作者
机构
来源
J Appl Phys | / 11卷 / 6266期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 28 条
  • [1] The influence of argon pressure on the structure of sputtered molybdenum: From porous amorphous to a new type of highly textured film
    Klabunde, F
    Lohmann, M
    Blasing, J
    Drusedau, T
    JOURNAL OF APPLIED PHYSICS, 1996, 80 (11) : 6266 - 6273
  • [2] Influence of Annealing and Argon Pressure on the Microcrystalline Structure of Magnetron-Sputtered Textured Cobalt Films
    Dzhumaliev, A. S.
    Nikulin, Yu. V.
    Filimonov, Yu. A.
    TECHNICAL PHYSICS, 2018, 63 (11) : 1678 - 1686
  • [3] Influence of Annealing and Argon Pressure on the Microcrystalline Structure of Magnetron-Sputtered Textured Cobalt Films
    A. S. Dzhumaliev
    Yu. V. Nikulin
    Yu. A. Filimonov
    Technical Physics, 2018, 63 : 1678 - 1686
  • [4] A NEW SPUTTERED AMORPHOUS THIN-FILM PRESSURE TRANSDUCER
    HUANG, JQ
    CHENG, XA
    WANG, ZY
    SENSORS AND ACTUATORS, 1989, 19 (01): : 13 - 22
  • [5] Influence of argon pressure on friction and wear characteristics in air of sputtered molybdenum disulfide films
    Matsuda, Kenji
    Koguma, Kiyonori
    Kaneta, Motohiro
    Ikeda, Michiaki
    Toraibarojisuto/Journal of Japanese Society of Tribologists, 2010, 55 (06): : 406 - 412
  • [6] THE INFLUENCE OF ARGON GAS-PRESSURE FOR SPUTTERED CO-CR THIN-FILM PREPARATION
    NIIMURA, Y
    NAOE, M
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1986, 54-7 : 1687 - 1688
  • [7] INFLUENCE OF ARGON PARTIAL-PRESSURE ON THE ELECTRICAL AND OPTICAL-PROPERTIES OF SPUTTERED HYDROGENATED AMORPHOUS-SILICON
    SWANEPOEL, R
    SWART, PL
    AHARONI, H
    THIN SOLID FILMS, 1985, 128 (3-4) : 191 - 203
  • [8] Influence of Argon Pressure on Friction and Wear Characteristics in Air of Sputtered Molybdenum Disulfide Films - Introduction Effect of Dry Air to Vacuum Chamber after Film Formation
    Matsuda, Kenji
    Koguma, Kiyonori
    Kaneta, Motohiro
    Ikeda, Michiaki
    JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS, 2010, 55 (06) : 406 - 412
  • [9] Influence of Oxygen Partial Pressure on Radio Frequency Magnetron Sputtered Amorphous InZnSnO Thin Film Transistors
    Lestari, Annisa Dwi
    Putri, Maryane
    Heo, Young-Woo
    Lee, Hee Young
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2020, 20 (01) : 252 - 256
  • [10] Influence of sputtering pressure on the structure and ionic conductivity of thin film amorphous electrolyte
    Hu, Zongqian
    Xie, Kai
    Wei, Di
    Ullah, Najeeb
    JOURNAL OF MATERIALS SCIENCE, 2011, 46 (23) : 7588 - 7593