Deposition of AlN films by DC reactive magnetron sputtering with closed-loop controlling target voltage

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[1] Chi, Huajing
[2] Guo, Shuai
[3] Xiong, Kai
[4] Wang, Shuang
[5] Chen, Ge
[6] Zhang, Qichu
来源：
Zhang, Q. (zqc43@163.com) | 1600年 / Science Press卷 / 34期
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Aluminum nitride;
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