Preparation and properties of N-doped TiO2 films by APCVD

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Wang, Wei-Wei [1 ]
Guo, Yu [1 ]
Zhang, Xi-Wen [1 ]
Han, Gao-Rong [1 ]
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[1] Department of Materials Science and Engineering, Silicon State Key Lab, Zhejiang University, Hangzhou 310027, China
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页码:187 / 191
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