High rate deposition of microcrystalline silicon thin films by VHF-PECVD

被引：0
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作者：
Zhao, Zhi-Wen [1 ,2 ]
Liu, Yu-Ling [1 ]
机构：
[1] School of Information Engineering, Hebei University of Technology, Tianjin 300130, China
[2] School of Electronic Engineering, Tianjin University of Technology and Education, Tianjin 300222, China
来源：
Guangdianzi Jiguang/Journal of Optoelectronics Laser | 2011年 / 22卷 / 05期
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页码：722 / 724
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