Floating nanodot gate memory fabrication with biomineralized nanodot as charge storage node

被引:0
|
作者
Miura, Atsushi [1 ]
Uraoka, Yukiharu [1 ]
Fuyuki, Takashi [1 ]
Yoshii, Shigeo [2 ]
Yamashita, Ichiro [1 ,2 ,3 ]
机构
[1] Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma 630-0192, Japan
[2] Advanced Technology Research Laboratories, Matsushita Electric Industrial Co. Ltd., 3-4 Hikaridai, Kyoto 619-0237, Japan
[3] CREST, Japan Science and Technology Agency, 4-1-8 Honcho, Kawaguchi 332-0012, Japan
来源
Journal of Applied Physics | 2008年 / 103卷 / 07期
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Gate dielectrics;
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摘要
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