Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning

被引：3

作者：

Chen M. ^{[1
,2
]}

Xiang X. ^{[1
,2
]}

Jiang Y. ^{[1
,2
]}

Zu X. ^{[1
]}

Yuan X. ^{[2
]}

Zheng W. ^{[2
]}

Wang H. ^{[2
]}

Li X. ^{[2
]}

Lü H. ^{[2
]}

Jiang X. ^{[2
]}

Wang C. ^{[2
]}

机构：

[1] School of Physical Electronics, University of Electronic Science and Technology of China

[2] Research Center of Laser Fusion, CAEP, Mianyang 621900

来源：

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2010年 / 22卷 / 06期

关键词：

Chemical etching; Fused silica; Laser conditioning; Laser induced damage threshold; Transmittance;

D O I：

10.3788/HPLPB20102206.1383

中图分类号：

学科分类号：

摘要：

Acid etching combined with UV laser conditioning is developed to enhance the laser induced damage threshold (LIDT) of fused silica. Firstly, the fused silica is etched for 1~100 min with a buffered 1% HF solution. After acid etching, its transmittance, surface roughness and LIDT are measured. The results reveal that the fused silica has the highest LIDT and transmittance after etching for 10 min. Then UV laser (355 nm) conditioning is adopted to process the 10-min-etched fused silica. When the laser fluence is below 60% of fused silica's zero probability damage threshold, the LIDT increases gradually with the increase of laser conditioning fluence. However, the LIDT rapidly decreases to be lower than the threshold of the 10-min-etched fused silica when the conditioning fluence is up to 80% of the threshold. Proper acid etching and laser conditioning parameters will effectively enhance the laser damage resistance of fused silica.

引用

页码：1383 / 1387

页数：4

共 19 条

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