Fabrication of a micromachined tunable capacitor using the complementary metal-oxide-semiconductor post-process of etching metal layers

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Department of Mechanical Engineering, National Chung Hsing University, Taichung, 402, Taiwan [1 ]
不详 [2 ]
不详 [3 ]
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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1600年 / 45卷 / 2 A期
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页码：1018 / 1020
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