Reflective and absorptive anti-laser film for 1064 nm, 532 nm, and 680 nm wavelengths

被引：0

作者：

State Key Laboratory of Coal Conversion, Institute of Coal Chemistry, Chinese Academy of Sciences, Taiyuan 030001, China ^{[1
]}

不详 ^{[2
]}

机构：

来源：

Qiangjiguang Yu Lizishu | 2007年 / 9卷 / 1556-1560期

关键词：

Laser damage - Light absorption - Refractive index - Silica - Sol-gel process - Zirconia;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

With ZrO2 and AlCl2Pc/SiO2 as high and low refractive index materials respectively, the high reflective film of 21 layers was deposited on well-cleaned polycarbonate substrate via sol-gel process. The film was designed as λ0/6-λ0/3 typed periodic symmetric coating stacks. Reflection to 1064 nm and 532 nm lasers was realized. At the same time, absorption to 680 nm laser was obtained. The transmissivity at 1064 nm, 532 nm, and 680 nm were 1.67%, 18.24% and 2.4% respectively. With this method, anti-laser protection was easily acquired at these three laser wavelengths.

引用

共 50 条

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