Recent developments in plasma nitriding treatment technology

被引：0
|
作者：
Nishimoto, Akio [1 ]
机构：
[1] Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University, 3-3-35 Yamate-cho, Suita-shi, Osaka 564-8680, Japan
来源：
Journal of the Vacuum Society of Japan | 2013年 / 56卷 / 08期
关键词：
Nitriding;
D O I：
10.3131/jvsj2.56.303
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：303 / 306
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