Adsorption behavior of As(III) onto chitosan resin with As(III) as template ions

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[1] Liu, Bingjie
[2] Lv, Xin
[3] Wang, Dongfeng
[4] Xu, Ying
[5] Zhang, Li
[6] Li, Yujin
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Wang, D. (wangdf@ouc.edu.cn) | 1600年 / John Wiley and Sons Inc卷 / 125期
关键词：
A novel; biobased chitosan resin was successfully synthesized; characterized; and applied for the selective removal of As(III) from aqueous solutions. Batch adsorption experiments were performed to evaluate its adsorption conditions; selectivity; and reusability. The results showed that the maximum adsorption capacity was 2.16 mg/g; observed at pH 6 and 40°C. Equilibrium adsorption was achieved within 8 h. The kinetic data; obtained at optimal pH 6; could be fitted with a pseudosecond order equation. Adsorption process could be well described by Langmuir adsorption isotherm model and the maximum adsorption capacity calculated from Langmuir equation was 4.45 mg/g. The selectivity coefficient of As(III) ions and other metal cation onto As-ICR indicated an overall preference for As(III) ions; which was much higher than nonimprinted chitosan resins. Finally; the adsorption mechanisms were studied by Fourier transform infrared spectra; X-ray diffraction; and differential scanning calorimetry analysis. The result reveals that the adsorption of As-ICR for As(III) is a chelation process. These results earlier confirmed that As-ICR is a very promising sorbent for selective adsorption of As(III) ions from aqueous solutions. Copyright © 2011 Wiley Periodicals; Inc;
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