Sub-100 nm patterning of supported bilayers by nanoshaving lithography

被引：0
|
作者：
Shi, Jinjun [1 ]
Chen, Jixin [1 ]
Cremer, Paul S. [1 ]
机构：
[1] Department of Chemistry, Texas A and M University, P.O. Box 30012, College Station, TX 77843-3012, United States
来源：
Journal of the American Chemical Society | 2008年 / 130卷 / 09期
关键词：
31;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Journal article (JA)
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页码：2718 / 2719
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