Depth profiling of Fe-implanted Si(100) by means of X-ray reflectivity and extremely asymmetric X-ray diffraction

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[1] Khanbabaee, B.
[2] Biermanns, A.
[3] Facsko, S.
[4] Grenzer, J.
[5] Pietsch, U.
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Khanbabaee, B. (khanbabaee@physik.uni-siegen.de) | 1600年 / International Union of Crystallography, 5 Abbey Road, Chester, CH1 2HU, United Kingdom卷 / 46期
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