Experimental investigation of polishing temperature by bionic polishing pad with phyllotactic pattern

被引:0
|
作者
机构
[1] Sheng, Xiaolong
[2] Long, Hua
[3] Luo, Yongxin
[4] Zhang, Mingjun
来源
Sheng, X. (shenxl64@163.com) | 1613年 / Sila Science, University Mah Mekan Sok, No 24, Trabzon, Turkey卷 / 31期
关键词
6;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Material Removal Distribution of Chemical Mechanical Polishing by the Bionic Polishing Pad with Phyllotactic Pattern
    Lu, Yushan
    Wang, Jun
    Li, Nan
    Zhang, Tian
    Duan, Min
    Xing, Xueling
    APPLICATION OF DIAMOND AND RELATED MATERIALS, 2011, 175 : 87 - 92
  • [2] Analysis on the Contact Pressure Distribution of Chemical Mechanical Polishing by the Bionic Polishing Pad with Phyllotactic Pattern
    Lv, Y. S.
    Li, N.
    Wang, J.
    Zhang, T.
    Duan, M.
    Xing, X. L.
    DIGITAL DESIGN AND MANUFACTURING TECHNOLOGY II, 2011, 215 : 217 - 222
  • [3] An Investigation on a Tin Fixed Abrasive Polishing Pad with Phyllotactic Pattern for Polishing Wafer
    吕玉山
    刘电飞
    寇智慧
    Journal of China Ordnance, 2012, 8 (03) : 174 - 180
  • [4] Development of a Novel Polishing Pad with a Phyllotactic Pattern, and Experimental Studies
    Yushan Lu
    Jun Wang
    Yueming Liu
    Xueling Xing
    Journal of Electronic Materials, 2014, 43 : 2738 - 2746
  • [5] Development of a Novel Polishing Pad with a Phyllotactic Pattern, and Experimental Studies
    Lu, Yushan
    Wang, Jun
    Liu, Yueming
    Xing, Xueling
    JOURNAL OF ELECTRONIC MATERIALS, 2014, 43 (07) : 2738 - 2746
  • [6] Analysis of the Polishing Slurry Flow of Chemical Mechanical Polishing by Polishing Pad with Phyllotactic Pattern
    Lv Yushan
    Zhang Tian
    Wang Jun
    Li Nan
    Duan Min
    Xing Xue-Ling
    FOURTH INTERNATIONAL SEMINAR ON MODERN CUTTING AND MEASUREMENT ENGINEERING, 2011, 7997
  • [7] Design and Fabrication on the Electroplating Polishing Pad with Phyllotactic Pattern
    Lu, Yushan
    Kou, Zhihui
    Jun, Wang
    Zhao, Chengyi
    ADVANCED MANUFACTURING TECHNOLOGY, PTS 1-4, 2012, 472-475 : 2568 - 2573
  • [8] Contact Pressure Distribution of Chemical Mechanical Polishing Based on Bionic Polishing Pad
    Wang, Jun
    Xing, Xue-Ling
    Lu, Yu-Shan
    Zhang, Liao-Yuan
    FOURTH INTERNATIONAL SEMINAR ON MODERN CUTTING AND MEASUREMENT ENGINEERING, 2011, 7997
  • [9] Polishing Pad in Chemical Mechanical Polishing
    Cao W.
    Deng Z.-H.
    Li Z.-Y.
    Ge J.-M.
    Surface Technology, 2022, 51 (07): : 27 - 41
  • [10] Wear of Polishing Pad and Pattern Optimization of Fixed Abrasive Pad
    Li, Mao
    Zhu, Yongwei
    Li, Jun
    Ye, Jianfeng
    Fan, Jilong
    ADVANCES IN ABRASIVE TECHNOLOGY XIII, 2010, 126-128 : 82 - 87