Damage characteristic improvement of high reflectors by SiO2 overlayer

被引:2
|
作者
Liu X. [1 ]
Li X. [1 ]
Zhao Y. [1 ]
Li D. [1 ]
Shao J. [1 ]
Fan Z. [1 ]
机构
[1] Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
关键词
Damage morphology; Delamination; Fundamental frequency high reflectors; Overlayers; Pits; Plasma ablation;
D O I
10.3788/HPLPB20102212.2860
中图分类号
学科分类号
摘要
In order to study the damage mechanism of high reflectors in high power laser systems, laser damage experiments are carried out on fundamental frequency high reflectors which are widely used in high power laser systems, and then the typical morphologies are compared and analyzed by means of step profiler, scanning electron microscope and surface profiler. The results show that the laser resistance is enhanced because of the SiO2 overlayer; typical damage morphology of the sample without silica overlayer is delamination, which is related to the thermal characteristics of materials, and delamination grows quickly during the subsequent laser irradiation; typical damage morphology of the sample with silica overlayer is plasma ablation with a pit in its center, which is related to the thermal mechanics of defects sputtering. The bulge around pits is the macroscopical manifestation of this mechanics effect and plasma ablation with a pit is relatively stable during the subsequent laser irradiation comparing to delamination. The addition of SiO2 overlayer restrains the occurrence of delamination and improves the damage characteristic of the samples.
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页码:2860 / 2864
页数:4
相关论文
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