Study on pellicle optimization and polarization aberration induced by pellicle in hyper numerical aperture lithography

被引：0
|
作者：
Zhou Y. [1 ,3 ]
Li Y. [2 ]
Liu G. [1 ,3 ]
机构：
[1] Department of Electronic and Communication Engineering, Changsha University, Changsha
[2] State Key Laboratory of Opto-Electro Imaging Technology and System. Ministry of Education, School of Information Science and Technology, Beijing Institute of Technology
[3] Optoelectronic Information Technology Innovative Research Team, Changsha University, Changsha
来源：
Zhongguo Jiguang/Chinese Journal of Lasers | 2011年 / 38卷 / 04期
关键词：
Film optics; Hyper numerical aperture lithography; Imaging systems; Johns matrix representation; Pellicle; Polarization aberration;
D O I：
10.3788/CJL201138.0407001
中图分类号：
学科分类号：
摘要：
In hyper numerical aperture (NA) lithography imaging, the incident angle of imaging rays on pellicle varies in a wide range, so it is difficult to enhance the transmittance of oblique incidence employing the conventional pellicle optimization methods. A novel pellicle optimization method is developed based on the film optics theory, which maximizes the average transmittance within the whole incident angles range. The transmission properties and phase characteristics of pellicle are studied using Johns matrix representation. The corresponding Johns pupil is obtained to analyze the polarization aberration induced by pellicle. The results show that, compared with the conventional pellicle optimization methods, the novel method enhances the transmittance of oblique incidence and decreases the pellicle-induced polarization aberration more effectively. The novel method provides the essential theoretical basis and technical support for pellicle setting in hyper NA lithography imaging.
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