Structural and optical characteristics of epitaxially grown AlGaAsBi on GaAs for potential application in ultra-low noise avalanche photodiodes
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Braza, V.
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Univ Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, SpainUniv Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, Spain
Braza, V.
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Ben, T.
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Univ Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, SpainUniv Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, Spain
Ben, T.
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Reyes, D. F.
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Univ Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, SpainUniv Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, Spain
Reyes, D. F.
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Bailey, N. J.
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Univ Sheffield, Dept Elect & Elect Engn, Sir Frederick Mappin Bldg,Mappin St, Sheffield S1 3JD, EnglandUniv Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, Spain
Bailey, N. J.
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Carr, M. R.
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Univ Sheffield, Dept Elect & Elect Engn, Sir Frederick Mappin Bldg,Mappin St, Sheffield S1 3JD, EnglandUniv Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, Spain
Carr, M. R.
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Richards, R. D.
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Univ Sheffield, Dept Elect & Elect Engn, Sir Frederick Mappin Bldg,Mappin St, Sheffield S1 3JD, EnglandUniv Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, Spain
Richards, R. D.
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Gonzalez, D.
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Univ Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, SpainUniv Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, Spain
Gonzalez, D.
[1
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机构:
[1] Univ Cadiz, Univ Res Inst Electron Microscopy & Mat IMEYMAT, Puerto Real 11510, Cadiz, Spain
[2] Univ Sheffield, Dept Elect & Elect Engn, Sir Frederick Mappin Bldg,Mappin St, Sheffield S1 3JD, England
The recent addition of Bi to GaAs has been demonstrated to be an effective method for reducing excess noise in avalanche photodiodes (APDs), owing to the significant decrease in the hole ionization coefficient. It has been proposed that the incorporation of group III elements in GaAsBi alloys, such as Al, could facilitate the development of a novel class of ultra-low noise APDs utilizing GaAs substrates. However, the structural attributes of these novel alloys have not yet been comprehensively investigated, and the inclusion of Al can potentially exacerbate the significant challenges associated with the integration of Bi into GaAs. The influence of different parameters in AlGaAsBi alloys, such as the Bi flux and III/As ratio, was examined using transmission scanning electron microscopy, Nomarsky microscopy, and photoluminescence techniques. In addition to analyzing the quality of the interfaces, particular attention has been devoted to the occurrence of volcano-shaped surface nanomotifs. Two distinct types of nano-motifs associated with Bi-Al and Ga-Al-Bi droplet formation during AlGaAsBi deposition under different conditions were characterized. The growth regimes that govern the formation of surface droplets on AlGaAsBi were significantly altered by the concomitant presence of Al.
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School of Electronic Science and Engineering, Nanjing University, Nanjing,210023, ChinaSchool of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China
Cao, Jing
Wang, Haiping
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School of Electronic Science and Engineering, Nanjing University, Nanjing,210023, ChinaSchool of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China
Wang, Haiping
You, Haifan
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School of Electronic Science and Engineering, Nanjing University, Nanjing,210023, ChinaSchool of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China
You, Haifan
Zhang, Feiyu
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School of Electronic Science and Engineering, Nanjing University, Nanjing,210023, ChinaSchool of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China
Zhang, Feiyu
Lu, Hai
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School of Electronic Science and Engineering, Nanjing University, Nanjing,210023, ChinaSchool of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China
Lu, Hai
Zhang, Rong
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School of Electronic Science and Engineering, Nanjing University, Nanjing,210023, ChinaSchool of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China
Zhang, Rong
Zheng, Youdou
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School of Electronic Science and Engineering, Nanjing University, Nanjing,210023, ChinaSchool of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China
Zheng, Youdou
Chen, Dunjun
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School of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China
Ministry of Education Engineering Research Center for Optoelectronic Materials and Chip Technology, Nanjing University, Nanjing,210023, ChinaSchool of Electronic Science and Engineering, Nanjing University, Nanjing,210023, China