Polarization retention on short, intermediate, and long time scales in ferroelectric thin films
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作者:
Lou, X.J.
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Department of Materials Science and Engineering, National University of Singapore, Singapore 117574, SingaporeDepartment of Materials Science and Engineering, National University of Singapore, Singapore 117574, Singapore
Lou, X.J.
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机构:
[1] Department of Materials Science and Engineering, National University of Singapore, Singapore 117574, Singapore