Thermal management of hybrid silicon ring lasers for high temperature operation

被引：0

作者：

Zhang, Chong ^{[1
,2
]}

Liang, Di ^{[1
]}

Kurczveil, Geza ^{[1
]}

Bowers, John E. ^{[2
]}

Beausoleil, Raymond G. ^{[1
]}

机构：

[1] Systems Research Laboratory, Hewlett-Packard Laboratories, Palo Alto,CA,94304, United States

[2] Department of Electrical Engineering, University of California, Santa Barbara,CA,93106, United States

来源：

HP Laboratories Technical Report | 2015年 / 40期

关键词：

Continuous wave lasing - High temperature - Hybrid silicon - Lasing performance - Micro-ring lasers - Thermal impedance - Thermal shunt;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

We discuss the thermal management of microring lasers on hybrid silicon platform in order to optimize their high-temperature lasing performance. The thermal impedance of microring lasers was improved with a novel thermal shunt design. We report a significant improvement of hybrid silicon microring laser performance, with the maximum continuous wave lasing stage temperature up to 105 °C. © Copyright 2015 Hewlett-Packard Development Company, L.P.

引用

页码：1 / 7

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