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- [1] The Motion-Overlap Scheme for Reducing the Time between Continuous Scans of Wafer Stage for Step-and-Scan Lithography FRONTIERS OF MANUFACTURING AND DESIGN SCIENCE II, PTS 1-6, 2012, 121-126 : 110 - +
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- [3] Synchronous Control Strategy of Wafer and Reticle Stage of Step and Scan Lithography 6TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF SMART STRUCTURES, MICRO- AND NANO- OPTICAL DEVICES, AND SYSTEMS, 2012, 8418
- [4] Time-Optimal Control of Wafer Stage Positioning Using Simplified Models VARIATIONAL AND OPTIMAL CONTROL PROBLEMS ON UNBOUNDED DOMAIN, 2014, 619 : 99 - 107
- [7] The multi-motion-overlap strategy to minimize time between continuous exposure scans for wafer stage ICEPT: 2007 8TH INTERNATIONAL CONFERENCE ON ELECTRONICS PACKAGING TECHNOLOGY, PROCEEDINGS, 2007, : 492 - 498