Effect of pulse bias voltage on adhesive strength of magnetron sputtering ion plated al coating on depleted uranium surface

被引：0
|
作者：
Wang, Qing-Fu [1 ]
Xian, Xiao-Bin [1 ]
Liu, Ke-Zhao [1 ]
Liu, Qing-He [1 ]
机构：
[1] China Academy of Engineering Physics, P.O. Box 919-71, Mianyang 621900, China
来源：
Yuanzineng Kexue Jishu/Atomic Energy Science and Technology | 2007年 / 41卷 / 03期
关键词：
Magnetron sputtering;
D O I：
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学科分类号：
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页码：268 / 272
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