Assessing the challenges of EUV lithography

被引：0
|
作者：
IMEC, Leuven, Belgium [1 ]
机构：
来源：
Solid State Technol | 2007年 / 2卷 / 64期
关键词：
(Edited Abstract);
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Assessing the challenges of EUV lithography
    Ronse, Kurt
    SOLID STATE TECHNOLOGY, 2007, 50 (02) : 64 - 64
  • [2] EUV Lithography: Prospects and Challenges
    Sivakumar, Sam
    2011 16TH ASIA AND SOUTH PACIFIC DESIGN AUTOMATION CONFERENCE (ASP-DAC), 2011,
  • [3] EUV lithography: Main challenges
    Banine, V
    Benschop, J
    MICRO- AND NANOELECTRONICS 2003, 2004, 5401 : 1 - 7
  • [4] Current Challenges and Opportunities for EUV Lithography
    Levinson, Harry J.
    Brunner, Timothy A.
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018, 10809
  • [5] EUV lithography: New metrology challenges
    Wood, Obert
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007, 2007, 931 : 375 - 381
  • [6] Progresses and Challenges of EUV Lithography Materials
    De Simone, Danilo
    Goethals, Anne-Marie
    Van Roey, Frieda
    Zheng, Tao
    Foubert, Philippe
    Hendrickx, Eric
    Vandenberghe, Geert
    Ronse, Kurt
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2014, 27 (05) : 601 - 610
  • [7] EUV Lithography - Progress, Challenges and Outlook
    Wurm, S.
    30TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2014, 9231
  • [8] Opportunities and challenges in device scaling by the introduction of EUV lithography
    Ronse, K.
    De Bisschop, P.
    Vandenberghe, G.
    Hendrickx, E.
    Gronheid, R.
    Pret, A. Vaglio
    Mallik, A.
    Verkest, D.
    Steegen, A.
    2012 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2012,
  • [9] EUV Lithography's Path to Manufacturing: Challenges and Opportunities
    Light, Scott
    2018 IEEE WORKSHOP ON MICROELECTRONICS AND ELECTRON DEVICES (WMED), 2018, : XV - XV
  • [10] EUV lithography with the Alpha Demo Tools: status and challenges
    Harned, Noreen
    Goethals, Mieke
    Groeneveld, Rogier
    Kuerz, Peter
    Lowisch, Martin
    Meijer, Henk
    Meiling, Hans
    Ronse, Kurt
    Ryan, James
    Tittnich, Michael
    Voorma, Harm-Jan
    Zimmerman, John
    Mickan, Uwe
    Lok, Sjoerd
    EMERGING LITHOGRAPHIC TECHNOLOGIES XI, PTS 1 AND 2, 2007, 6517
12345