Correlation between temperature distribution and changes in self-organized luminous pattern in an atmospheric pressure DC glow discharge with sheath gas flow

The self-organized luminous patterns observed above the anode surface in atmospheric-pressure DC glow discharges were changed by the composition of the gas flow. The patterns were observed not only with liquid anodes but also with metal anodes. Various pattern structures were observed by changing the helium gas flow rate in the core and the ambient oxygen gas flow rate supplied during the discharge. When the pattern formation was observed, the emission spectra and the radial spread of the positive column changed, and the voltage-current characteristic also changed. These results suggest that not only the anode surface but the entire discharge affects the pattern formation. Comparing the results for the liquid and metal anodes, the trends in the pattern formation and voltage-current characteristics were almost identical. The gas temperature in the discharge was also investigated in two different ways, by the laser-induced fluorescence spectroscopy of OH radicals and by Rayleigh scattering, showing in good agreement between both methods. Under the condition where the pattern formed, the gas temperature in the discharge was approximately 2500-3000 K and higher than that of the discharge without the pattern formation. Focusing on the gradient of the temperature distribution, the discharge with the pattern formation had a steeper gradient than that of the discharge without the pattern formation. It is suggested that not only the high temperature of the discharge but also the large gradient of the temperature change plays an important role in the pattern formation. The role of oxygen gas in the pattern formation may be the effect of increasing the temperature and altering the temperature gradient in the discharge rather than generating negative ions in the discharge. © 2024 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.