Grating interferometric precision nanometric measurement technology

被引：0
|
作者：
Li, Xinghui [1 ,2 ]
Cui, Can [1 ]
机构：
[1] Shenzhen International Graduate School, Tsinghua University, Shenzhen,518055, China
[2] Tsinghua-Berkeley Shenzhen Institute, Tsinghua University, Shenzhen,518055, China
来源：
Guangxue Jingmi Gongcheng/Optics and Precision Engineering | 2024年 / 32卷 / 17期
关键词：
Laser interferometry;
D O I：
10.37188/OPE.20243217.2591
中图分类号：
学科分类号：
摘要：
Grating interferometry is a crucial technology in precision nanometrology, valued for its high resolution, robustness, and adaptability for multi-axis measurement systems. It is essential in advanced semiconductor manufacturing and ultra-precision machine tools. This review first compares grating interferometry with laser interferometry and time grating, detailing their applications and performance. It then explains the two main principles: homodyne and heterodyne grating interferometry. The review also analyzes global development trends, highlighting key manufacturers and advancements in achieving nanometric to sub-nanometric precision in single and multi-axis systems. In addition, it examines error sources, classifications, and compensation methods in grating interferometry. Finally, it discusses the current state and future prospects of grating interferometers, offering insights for developing and optimizing measurement systems based on this technology. © 2024 Chinese Academy of Sciences. All rights reserved.
引用
收藏
页码：2591 / 2611
相关论文
共 50 条
  • [1] TECHNOLOGY AND APPLICATIONS OF GRATING INTERFEROMETERS IN HIGH-PRECISION MEASUREMENT
    TEIMEL, A
    PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING, 1992, 14 (03): : 147 - 154
  • [2] Technology and application of grating interferometers in high-precision measurement
    Teimel, A.
    Proceedings of the International Precision Engineering Seminar, 1991,
  • [3] Precision Measurement of Displacement with Two Quasi-Orthogonal Signals for Linear Diffraction Grating Interferometric Sensors
    Bi, Jianglin
    Liu, Shoubin
    PROCEEDINGS OF THE 2016 6TH INTERNATIONAL CONFERENCE ON MACHINERY, MATERIALS, ENVIRONMENT, BIOTECHNOLOGY AND COMPUTER (MMEBC), 2016, 88 : 25 - 29
  • [4] HIGH-PRECISION INTERFEROMETRIC ALIGNMENT USING CHECKER GRATING
    TABATA, M
    TOJO, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1980 - 1983
  • [5] INTERFEROMETRIC MEASUREMENT OF CORNEAL THICKNESS WITH MICROMETER PRECISION
    HITZENBERGER, CK
    BAUMGARTNER, A
    DREXLER, W
    FERCHER, AF
    AMERICAN JOURNAL OF OPHTHALMOLOGY, 1994, 118 (04) : 468 - 476
  • [6] Challenges and Limits of the Interferometric Precision Measurement Technique
    Jaeger, Gerd
    TM-TECHNISCHES MESSEN, 2011, 78 (03) : 114 - 117
  • [7] Process measurement technology and precision measurement technology
    Froehlich, Thomas
    Kissinger, Thomas
    Manske, Eberhard
    TM-TECHNISCHES MESSEN, 2024, 91 (05) : 231 - 232
  • [8] INTERFEROMETRIC STRAIGHTNESS MEASUREMENT SYSTEM USING A HOLOGRAPHIC GRATING
    YAMAUCHI, M
    MATSUDA, K
    OPTICAL ENGINEERING, 1994, 33 (04) : 1078 - 1083
  • [9] Ultra-Precision and High-Speed Laser Interferometric Displacement Measurement Technology and Instrument
    Yang Hongxing
    Fu Haijin
    Hu Pengcheng
    Yang Ruitao
    Xing Xu
    Yu Liang
    Chang Di
    Tan Jiubin
    LASER & OPTOELECTRONICS PROGRESS, 2022, 59 (09)
  • [10] An Approach to Improve the Precision of the Grating Interferometer Measurement
    Li, Shuqiu
    Liu, Shufen
    Xia, Liang
    Zheng, Wanbo
    Wang, Xiaoyan
    9TH INTERNATIONAL CONFERENCE ON COMPUTER-AIDED INDUSTRIAL DESIGN & CONCEPTUAL DESIGN, VOLS 1 AND 2, 2008, : 639 - 641
12345