Research progress of multilayer optical elements in extreme ultraviolet and vacuum ultraviolet

被引:0
|
作者
Qi R. [1 ]
Zhang J. [1 ]
Huang Q. [1 ]
Zhang Z. [1 ]
Wang Z. [1 ]
机构
[1] Institute of Precision Optical Engineering, MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai Frontiers Science Center of Digital Optics, Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin
关键词
extreme ultraviolet and vacuum ultraviolet; high reflectivity; narrow bandwidth; stability; thin film element; uniformity;
D O I
10.37188/OPE.20223021.2639
中图分类号
学科分类号
摘要
Extreme ultraviolet(EUV)and vacuum ultraviolet(VUV)high-performance,thin-film optical elements considerably improve the capability of conducting high-precision observations and contribute to the development of materials as well as advancements in astronomy,physics,and other disciplines. According to the different application requirements and physical and chemical properties of materials,the Institute of Precision Optical Engineering(IPOE)at Tongji University successfully developed high-performance thin film mirrors,which could meet the application requirements of entire EUV and VUV wavelength ranges(10-200 nm). This study presents the research progress obtained at the IPOE on the development of EUV and VUV thin-film optical elements. In this paper,the features of thin-film mirrors,monochromators,and polarizers for EUV vacuum band operation are presented. By investigating and characterizing the film’s internal microstructure and its physical and chemical mechanism,a system of film representation,optimization,preparation is established. Additionally,the thickness uniformity,reflectance,response bandwidth,stability,and polarization are improved. The developed mirrors have already been applied to domestic,large-scale scientific instruments(from ground to space). © 2022 Chinese Academy of Sciences. All rights reserved.
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页码:2639 / 2654
页数:15
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