Leading Sustainability Applications for More Responsible Logic Technology Development

被引:0
|
作者
Bodtker, Teresa E. [1 ]
Riley, Richard A. [1 ]
Ozer, Soley [1 ]
Gardner, Sanaz K. [1 ]
Russell, Ryan J. [1 ]
Birdsall, Jeffrey [1 ]
Johnson, Sam P. [1 ]
机构
[1] Intel Corporation, Hillsboro,OR,97124, United States
关键词
ACKNOWLEDGMENT The authors would like to thank Intelu2019s senior leadership for financial support of the work presented in this paper. They would also like to thank the Intel factory & facilities engineers & managers for their technical contributions to this paper: Intel Legal especially Lisa Lowry LTD CMP group especially Hao Chien; Abhinav Tripathi; Sofia Coats; Ruben Spritz; Mumukshu Patel; Kaylee Philips; Kevin Holm; Elena Shoushpanova; and Ali Hemmasian Ettefagh LTD Wet Etch group especially Paul Cordeiro; Shauna-Gaye Campbell; Nishant Chetwani; Angel Aquino; Mara Howell; and Dan Simon LTD Dry Etch group especially Dan Mastarone; Janell Neulinger; Samantha Roberts; Jill Craven; and Mark Anderson LTD Diffusion group especially Ray Cotner; Robert James; Anthony Nelson; Aaron White; Dain Bassett; Sheldon Martin; Shawn Olsen; LTD Thin Films group especially Erhard Lederer; Robert Tacito; Shawn Hayden; Robert Laine; and Aaron Rosenbaum LTD VSG group especially Ernesto Rubio; Zachary Moore; Laura Masury; and Chris Guymon LTD Litho group especially Kevin Proctor; Clark Allen; and Dale Harper Logic Technology Operations (LTO) Environmental and Liquid Industrial Waste System group especially Nicole Becker; Hengjing Yan; Matthew Hicks; Bryan Kirby; Tanvi Gadgil; Lyndsey Earl and Vivek Ravi LTO group especially Mo Duhig; Christian Hawley & David Huang LTD Manufacture especially Justin Littlejohn CSTD facilities group especially Tim Alig; Ian Bickford; Steve Edmund; Brian Lemme; Jon Longley; and Sam Johnson CS Sustainability group especially Rachael Cavanagh; Vanessa Delbridge; Fawn Bergen; and Todd Brady CS Central Engineering especially Kevin Geoghegan Supply Chain group especially Johnny Christo; Jenna Lingwood; Ted Jefferies; Kristina Torsiello; Taimur Burki; Trini Decker; Angie Esparza; Jason Zanotti; and Yu Jun Leong;
D O I
10.1109/TSM.2024.3438098
中图分类号
学科分类号
摘要
2
引用
收藏
页码:428 / 432
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