Temperature-Dependent ESD Breakdown in AlGaN/GaN HEMTs With Carbon-Doped Buffer

被引:0
|
作者
Ateeb Munshi, Mohammad [1 ]
Ashraf Mir, Mehak [1 ]
Joshi, Vipin [1 ]
Roy Chaudhuri, Rajarshi [1 ]
Malik, Rasik [1 ]
Shrivastava, Mayank [1 ]
机构
[1] Indian Institute of Science, Department of Electronic Systems Engineering, Bengaluru,560012, India
关键词
Aluminum gallium nitride - Aluminum nitride - Electric breakdown - Electroluminescence - Electrostatic devices - Electrostatic discharge - Gallium phosphide - High electron mobility transistors - III-V semiconductors - Semiconductor doping;
D O I
10.1109/TED.2024.3462375
中图分类号
学科分类号
摘要
This work investigates the temperature-dependent electrostatic discharge (ESD) behavior of AlGaN/GaN HEMTs using a transmission line pulsing system, which becomes relevant under practical system-level scenario. Two devices with different carbon doping concentrations in the buffer are tested. It is observed that in low-carbon-doped devices, breakdown/failure voltage (VBD) decreases with increasing temperature, while in the high-carbon-doped devices, VBDshows a weak temperature dependence. A unique behavior is identified where the location of the channel electric field peak determines the temperature-dependent ESD breakdown behavior of the GaN HEMT devices. When the channel electric field peaks at the field plate edge (FPE), VBDshows a negative temperature coefficient, whereas it shows a weaker temperature dependence when the channel electric field shifts to the drain edge (DE). In situ and on-the-fly electrical and optical characterizations, such as electroluminescence (EL) microscopy and micro-Raman spectroscopy, and TCAD computations are performed to get deeper insights into the failure mechanisms. Postfailure analysis using scanning electron microscopy and focused ion beam (FIB) microscopy is also carried out to probe material-level implications on the failure of LC and HC devices. © 1963-2012 IEEE.
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页码:6588 / 6595
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