The role of a tantalum interlayer in enhancing the properties of Fe3O4 thin films

被引：0
|
作者：
Ngo, Hai Dang [1 ]
Truong, Vo Doan Thanh [1 ]
Le, Van Qui [2 ]
Pham, Hoai Phuong [3 ]
Pham, Thi Kim Hang [1 ]
机构：
[1] Faculty of Applied Sciences, Ho Chi Minh University of Technology and Education, Ho Chi Minh City,720700, Viet Nam
[2] Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu,300093, Taiwan
[3] NTT Hi-Tech Institute, Nguyen Tat Thanh University, 298-300A Nguyen Tat Thanh Street, Ward 13, District 4, Ho Chi Minh City,700000, Viet Nam
来源：
Beilstein Journal of Nanotechnology | 2024年 / 15卷
关键词：
Saturation magnetization;
D O I：
10.3762/BJNANO.15.101
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：253 / 1259
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