Substrate controlled hydrophobicity of the Y2O3 films

被引:2
|
作者
Borowiec, Joanna [1 ]
Li, Lingxi [2 ]
Boi, Filippo S. [3 ]
Carmalt, Claire J. [1 ]
Parkin, Ivan P. [1 ]
机构
[1] UCL, Dept Chem, London WC1 H0AJ, England
[2] UCL, Dept Elect & Elect Engn, Torrington Pl, London WC1E 7JE, England
[3] Sichuan Univ, Coll Phys, Chengdu 610064, Peoples R China
基金
英国工程与自然科学研究理事会;
关键词
Hydrophobic coating; Rare earth oxide; Thin film; Aerosol assisted chemical vapor deposition; Self-cleaning coating; Anti-soiling coating; RARE-EARTH-OXIDES; THIN-FILMS; SURFACE; WATER; WETTABILITY; ORIENTATION; ENERGY; GROWTH; DEPENDENCE; SILICON;
D O I
10.1016/j.colsurfa.2024.134734
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The development of hydrophobic surfaces is an important factor for clean energy production from solar arrays, enabling their operation at the highest possible efficiencies for the longest possible time, without the need for physical intervention. This work reports the development of hydrophobic Y2O3 thin films on a range of transparent glass substrates. The growth of the Y2O3 films from the mono-hydrate yttrium (III) complex of 1,3diphenyl-1,3-propanedione [Y(dbm)3(H2O)] is studied using the aerosol-assisted chemical vapor deposition (AACVD) technique. The qualitative evaluation of the deposited films and their hydrophobicity is assessed using several materials characterization techniques, such as scanning electron microscopy, grazing incident X-ray diffraction, Fourier-transform infrared, X-Ray photoelectron spectroscopy, in addition to a surface free energy and water contact angle measurements. This work demonstrates experimentally a relationship between the Y2O3 wettability and its physico-chemical characteristics in terms of surface energy, chemical composition, and morphology which is controlled by the type of glass support used. The water contact angle of the hydrophobic Y2O3 coating grown on the F-doped tin oxide glass reached 128 degrees; currently the first deposited on transparent glass. This film exhibits the highest WCA reported up to date without the need for performing post-reaction surface treatment processes. The hydrophobic nature of the transparent Y2O3 films marks a significant leap forward in the field of anti-soiling coatings suitable for photovoltaic technology.
引用
收藏
页数:13
相关论文
共 50 条
  • [1] Electroluminescence of Y2O3:Eu and Y2O3:Sm films
    Rodionov, V. E.
    Shmidko, I. N.
    Zolotovsky, A. A.
    Kruchinin, S. P.
    MATERIALS SCIENCE-POLAND, 2013, 31 (02): : 232 - 239
  • [2] Preparation of Y2O3:Eu3+ thin films on the silver substrate
    Tabuchi, S.
    Tanaka, M.
    Yonekura, T.
    Yoshitake, M.
    Shinku/Journal of the Vacuum Society of Japan, 2001, 44 (03) : 232 - 235
  • [3] Controlled annealing of nanocrystalline Y2O3
    Vojilslavljevic, Dubravka Z.
    Borrmann, Horst
    ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 2011, 67 : C682 - C682
  • [4] Growth by laser ablation of Y2O3 and Tm:Y2O3 thin films for optical applications
    Huignard, A
    Aron, A
    Aschehoug, P
    Viana, B
    Théry, J
    Laurent, A
    Perrière, J
    JOURNAL OF MATERIALS CHEMISTRY, 2000, 10 (02) : 549 - 554
  • [5] Interfacial studies between cold-sprayedWO3, Y2O3 films and Si substrate
    Lee, HY
    Yu, YH
    Lee, YC
    Hong, YP
    Ko, KH
    APPLIED SURFACE SCIENCE, 2004, 227 (1-4) : 244 - 249
  • [6] Oxygen-segregation-controlled epitaxy of Y2O3 films on Nb(110)
    J. Hayoz
    M. Bovet
    T. Pillo
    L. Schlapbach
    P. Aebi
    Applied Physics A, 2000, 71 : 615 - 618
  • [7] Oxygen-segregation-controlled epitaxy of Y2O3 films on Nb(110)
    Hayoz, J
    Bovet, M
    Pillo, T
    Schlapbach, L
    Aebi, P
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2000, 71 (06): : 615 - 618
  • [8] Y2O3 Thin Films Characterized by XPS
    Barreca, Davide
    Battiston, Giovanni A.
    Berto, Davide
    Gerbasi, Rosalba
    Tondello, Eugenio
    Surface Science Spectra, 2001, 8 (03): : 234 - 239
  • [9] Growth and characterization of Y2O3 thin films
    Cheng, Xuerui
    Qi, Zeming
    Zhang, Guobin
    Zhou, Hongjun
    Zhang, Weiping
    Yin, Min
    PHYSICA B-CONDENSED MATTER, 2009, 404 (01) : 146 - 149
  • [10] HETEROEPITAXIAL GROWTH OF Y2O3 FILMS ON SILICON
    FUKUMOTO, H
    IMURA, T
    OSAKA, Y
    APPLIED PHYSICS LETTERS, 1989, 55 (04) : 360 - 361