Polarity controlled ScAlN multi-layer transduction structures grown by molecular beam epitaxy

被引:0
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作者
Mondal, Shubham [1 ]
Hershkovitz, Eitan [2 ]
Baucom, Garrett [2 ]
Hasan Tanim, Md Mehedi [1 ]
Dabas, Shaurya [3 ]
Chatterjee, Baibhab [3 ]
Kim, Honggyu [2 ]
Tabrizian, Roozbeh [3 ]
Mi, Zetian [1 ]
机构
[1] Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor,MI,48109, United States
[2] Department of Materials Science and Engineering, University of Florida, Gainesville,FL,32611, United States
[3] Electrical and Computer Engineering Department, University of Florida, Gainesville,FL,32611, United States
关键词
Agglomeration - Aluminum coatings - Aluminum gallium nitride - Hard facing - Indium phosphide - Molecular beam epitaxy - Organoclay - Oxides - Phosphorus compounds - Scandium - Scandium alloys - Scandium compounds - Selenium compounds - Wet etching;
D O I
10.1063/5.0225280
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学科分类号
摘要
We report on the molecular beam epitaxial growth and characterization of polarity-controlled single and multi-layer Scandium Aluminum Nitride (ScAlN) transduction structures grown directly on ScAlN templates deposited by physical vapor deposition (PVD) on Si(001) substrates. It is observed that direct epitaxial growth on PVD N-polar ScAlN leads to the flipping of polarity, resulting in metal (M)-polar ScAlN. By effectively removing the surface impurities, e.g., oxides, utilizing an in situ gallium (Ga)-assisted flushing technique, we show that high quality N-polar ScAlN epilayers can be achieved on PVD N-polar ScAlN templates. The polarity of ScAlN is confirmed by utilizing polarity-sensitive wet chemical etching and atomic-resolution scanning transmission electron microscopy. Through interface engineering, i.e., the controlled formation or removal of surface oxides, we have further demonstrated the ability to epitaxially grow an alternating tri-layer piezoelectric structure, consisting of N-polar, M-polar, and N-polar ScAlN layers. Such multi-layer, polarity-controlled ScAlN structures promise a manufacturable platform for the design and development of a broad range of acoustic and photonic devices. © 2024 Author(s).
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