Effect of Rapid Thermal Process on Oxygen Precipitation in Heavily Boron-Doped Czochralski Silicon Wafer

被引：0
|
作者：
Li, Chunlong [1 ]
Ma, Xiangyang [1 ]
Xu, Jin [1 ]
Yu, Xuegong [1 ]
Yang, Deren [1 ]
Que, Duanlin [1 ]
机构：
[1] Li, Chunlong
[2] Ma, Xiangyang
[3] Xu, Jin
[4] Yu, Xuegong
[5] Yang, Deren
[6] Que, Duanlin
来源：
Yang, D. (mseyang@dial.zju.edu.cn) | 1600年 / Japan Society of Applied Physics卷 / 42期
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摘要：
14
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页码：7290 / 7291
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