Studies of dead layer and reactions at interfaces of Ta/NiFe and NiFe/Ta

被引：0
|
作者：
Zhao, Hongchen [1 ]
Yu, Guanghua [2 ]
Si, Hong [3 ]
机构：
[1] Microelectronics Ctr., Chinese Acad. of Sci., Beijing 100029, China
[2] Dept. of Mat. Phys., Univ. of Sci. and Technol. Beijing, Beijing 100083, China
[3] Gen. Iron and Steel Res. Inst., Beijing 100081, China
来源：
| 2003年 / Science Press卷 / 23期
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摘要：
Magnetic thin films
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