Tight Focus Toward the Future: Tight Material Combination for Millimeter-Wave RF Power Applications: InP HBT SiGe BiCMOS Heterogeneous Wafer-Level Integration

被引:0
|
作者
Weimann N. [1 ]
Hossain M. [1 ]
Krozer V. [1 ]
Heinrich W. [1 ]
Lisker M. [2 ]
Mai A. [2 ]
Tillack B. [2 ]
机构
[1] Ferdinand Braun Institut, Leibniz Institut für Hoechstfrequenztechnik (FBH), Berlin
[2] Innovations for High Performance Microelectronics, Leibniz Institut für Innovative Mikroelektronik (IHP), Frankfurt
来源
IEEE Microwave Magazine | 2017年 / 18卷 / 02期
关键词
Semiconductor device manufacture - Si-Ge alloys - Bismuth alloys - Silicon wafers - III-V semiconductors - Semiconducting indium phosphide - Chip scale packages - BiCMOS technology - Indium phosphide - Heterojunction bipolar transistors;
D O I
10.1109/MMM.2016.2635859
中图分类号
学科分类号
摘要
The push to conquer the sparsely used electromagnetic spectrum between 100 and 1,000 GHz, commonly known as the millimeter-wave (mmW) and sub-mmW regions, is now in full force. The current rapid development of electronic circuits and subsystems beyond 100 GHz is enabled by improvements in high-frequency semiconductor technology and packaging techniques. In this article, we highlight recent advances we have developed in heterogeneous semiconductor-material chip integration for application toward the mmW frequency bands-in essence, a waferlevel integration approach that replaces chip-to-chip connections with monolithic integration. © 2017 IEEE.
引用
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页码:74 / 82
页数:8
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