Effect on substrate-film adherence of TiN film enhanced plasma nitriding

被引：0
|
作者：
Xiao, Zhi-Gang [1 ]
Lin, Dong-Sheng [1 ]
Zhang, Hong [1 ]
Guan, Ying [1 ]
Ye, Xi-Sheng [1 ]
机构：
[1] Northwest Inst. of Nucl. Technol., P.O. Box 69, Xi'an 710024, China
来源：
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2002年 / 14卷 / 01期
关键词：
Plasma generator - Plasma nitriding - Substrate film adherence;
D O I：
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摘要：
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页码：77 / 80
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