Crystallization of PECVD-deposited Amorphous Silicon Thin Films Using the Aluminum-induced Crystallization Technique

被引：0
|
作者：
Al-Dhafiri, A.M. [1 ]
机构：
[1] Department of Physics, College of Science, King Sand University, P. O. Box 2455, Riyadh,11451, Saudi Arabia
来源：
Journal of King Saud University - Engineering Sciences | 2003年 / 15卷 / 02期
关键词：
D O I：
10.1016/S1018-3639(18)30773-6
中图分类号：
学科分类号：
摘要：
17
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页码：235 / 247
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