Chemical reaction mechanisms of oxide layer formation via oxygen molecule at Ni(001) surface as observed by synchrotron photoemission spectroscopy

被引：0

作者：

Teraoka Y. ^{[1
]}

Iwai Y. ^{[2
]}

机构：

[1] National Institutes for Quantum and Radiological Science and Technology, 1-1-1, Kouto, Sayo-cho, Sayo-gun, Hyogo

[2] University of Hyogo, 3-2-1, Kouto, Kamigori-cho, Ako-gun, Hyogo

来源：

IEEJ Transactions on Electronics, Information and Systems | 2017年 / 137卷 / 03期

关键词：

Ni (001); Oxidation; Photoemission spectroscopy; Supersonic molecular beam; Synchrotron radiation;

D O I：

10.1541/ieejeiss.137.394

中图分类号：

学科分类号：

摘要：

Chemical reaction dynamics on the oxide formation at the Ni(001) surface has been studied via two quantum beams (synchrotron radiation and supersonic molecular beam). It was revealed that NiO layers formation took place at an oxygen coverage less than 0.5 ML depending on translational energy of oxygen molecules. Although dissociative adsorption of oxygen takes place via physical adsorption at lower translational energy than 0.06 eV, direct activated adsorption occurs at higher energy. Potential energy barrier height is 0.3 eV for the first barrier and 1.6 eV for the second one, respectively. © 2017 The Institute of Electrical Engineers of Japan.

引用

页码：394 / 399

页数：5

共 12 条

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