Role of ultra thin SiOxlayer for epitaxial growth of YSZ/SiOx/(001) Si thin films

被引：0
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作者：
Takanori, Kiguchi [1 ]
Naoki, Wakiya [2 ]
Kazuo, Shinozaki [3 ]
Nobuyasu, Mizutani [1 ]
机构：
[1] Center for Advanced Materials Analysis, Tokyo Institute of Technology, Japan
[2] Department of Metallurgy and Ceramic Science, Tokyo Institute of Technology, Japan
[3] Center for Advanced Materials Analysis, Tokyo Institute of Technology, Department of Metallurgy and Ceramic Science, Japan
来源：
Journal of the Ceramic Society of Japan | 2002年 / 110卷 / 1281期
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摘要：
Silica
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页码：338 / 342
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