Study of silicon oxynitride film deposited by RF magnetron sputtering

被引：0
|
作者：
Zhu, Yong [1 ]
Gu, Peifu [1 ]
Shen, Weidong [1 ]
Zou, Tong [1 ]
机构：
[1] Lab. of Modern Optical Instrum., Zhejiang Univ., Hangzhou 310027, China
来源：
Guangxue Xuebao/Acta Optica Sinica | 2005年 / 25卷 / 04期
关键词：
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摘要：
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页码：567 / 571
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